Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode.

Chiappim W; Testoni GE; Doria AC; Pessoa RS; Fraga MA; Galvão NK; Grigorov KG; Vieira L; Maciel HS

doi:10.1088/0957-4484/27/30/305701

Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode.

Identifier:nobleid.org/w1/20260526/C156DCFD

Type:Journal Article

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Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode.

Identifier:nobleid.org/w1/20260526/C156DCFD

Type:Journal Article

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