Growth behavior of high k LaAlO 3 films on Si by metalorganic chemical vapor deposition for alternative gate dielectric application

Qiyue Shao; Aidong Li; Jin-Bo Cheng; Huiqin Ling; Di Wu; Zhiguo Liu; Yongjun Bao; Mu Wang; Nai‐Ben Ming; Cathy Wang

doi:10.1016/j.apsusc.2004.12.037

Growth behavior of high k LaAlO 3 films on Si by metalorganic chemical vapor deposition for alternative gate dielectric application

Identifier:nobleid.org/w1/20260515/02B40F4F

Type:Journal Article

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Growth behavior of high k LaAlO 3 films on Si by metalorganic chemical vapor deposition for alternative gate dielectric application

Identifier:nobleid.org/w1/20260515/02B40F4F

Type:Journal Article

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