ALD deposited ZrO2 ultrathin layers on Si and Ge substrates | NobleID

Main

Mint Work Search Explore Works Knowledge Graph Citation Graph Bibliometrics Receipts

v1

ALD deposited ZrO2 ultrathin layers on Si and Ge substrates

Identifier:nobleid.org/w1/20260515/02FA5EEE

Type:Journal Article

0 views

Support unavailableClaim Your Authorship

View Original Paper Source

Embeddable Badge

[![NobleID](https://www.nobleid.org/api/badge/02FA5EEE.svg?ark=w1%2F20260515%2F02FA5EEE)](https://nobleid.org/work/w1/20260515/02FA5EEE)

ARK Inflections

Metadata Policy

Metadata Formats

Bibliometric Analysis

Impact metrics, research fronts, co-authorship networks →

Authors & Claims

Paper Authors

Claim authorship of this work

info@nobleid.org

About FAQ Terms Policy Persistence & Resolver Service Policy