瞬态闭锁试验在0.13 μm大规模集成电路中引起的潜在损伤 | NobleID

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瞬态闭锁试验在0.13 μm大规模集成电路中引起的潜在损伤

Identifier:nobleid.org/w1/20260515/14770CEC

Type:Journal Article

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