Hydrogen Plasma durability of the Fluorinated SnO2 Thin Films. | NobleID

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Hydrogen Plasma durability of the Fluorinated SnO2 Thin Films.

Identifier:nobleid.org/w1/20260515/5F4DF57A

Type:Journal Article

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Keishi KAWABATA

Yuuichi Takenaka

Hideaki SUNAMORI

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