Improvement of Breakdown Characteristics of the Gate Oxynitride Using N_20 | NobleID

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Improvement of Breakdown Characteristics of the Gate Oxynitride Using N_20

NobleID: NI1P96W00R64S39
Persistent link: https://nobleid.org/ark:/48914/w1/20260515/657CF440

Type:Journal Article

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Yukinori Kuroki

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