Resist performance in 5nm and 13nm soft X-ray projection lithography | NobleID

Knowledge Graph Citation Graph Docs

Main

Mint Work Search Explore Works Knowledge Graph Citation Graph Bibliometrics Receipts

v1

Resist performance in 5nm and 13nm soft X-ray projection lithography

Identifier:nobleid.org/w1/20260515/77CCB12D

Type:Journal Article

0 views

Support unavailableClaim Your Authorship

View Original Paper Source

Embeddable Badge

[![NobleID](https://www.nobleid.org/api/badge/77CCB12D.svg?ark=w1%2F20260515%2F77CCB12D)](https://nobleid.org/work/w1/20260515/77CCB12D)

ARK Inflections

Metadata Policy

Metadata Formats

Bibliometric Analysis

Impact metrics, research fronts, co-authorship networks →

Authors & Claims

Paper Authors

Masayuki Ohtani

Yoshio Yamashita

Katsuhiko Murakami

Claim authorship of this work

info@nobleid.org

About Terms Policy Persistence & Resolver Service Policy Pricing