v1
Challenges and Performance Limitations of High-k and Oxynitride Dielectrics Materials for Low Power CMOS Applications
- NobleID
- NI0P69W15R77S45
- Persistent link
- https://nobleid.org/ark:/48914/w1/20260515/8F04C02A
Type:Journal Article
0 views
Bibliometric Analysis
Impact metrics, research fronts, co-authorship networks →
Authors & Claims