Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment

Andrew C. Hourd; Anthony Grimshaw; Gerd Scheuring; Christian Gittinger; S. Doêbereiner; Frank Hillmann; Hans-Juergen Brueck; Shiuh-Bin Chen; Parkson W. Chen; R. Jonckheere

doi:10.1117/12.468090

Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment

Identifier:nobleid.org/w1/20260515/944CD342

Type:Conference Paper

0 views

Support unavailableClaim Your Authorship

View Original Paper Source

Embeddable Badge

[![NobleID](https://www.nobleid.org/api/badge/944CD342.svg?ark=w1%2F20260515%2F944CD342)](https://nobleid.org/work/w1/20260515/944CD342)

ARK Inflections

Metadata Policy

Metadata Formats

Bibliometric Analysis

Impact metrics, research fronts, co-authorship networks →

Authors & Claims

Paper Authors

Claim authorship of this work

Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment

Identifier:nobleid.org/w1/20260515/944CD342

Type:Conference Paper

0 views

Support unavailableClaim Your Authorship

View Original Paper Source

Embeddable Badge

[![NobleID](https://www.nobleid.org/api/badge/944CD342.svg?ark=w1%2F20260515%2F944CD342)](https://nobleid.org/work/w1/20260515/944CD342)

ARK Inflections

Metadata Policy

Metadata Formats

Bibliometric Analysis

Impact metrics, research fronts, co-authorship networks →

Authors & Claims

Paper Authors

Claim authorship of this work