Ternary phase analysis of interfacial silicates grown in HfOx/Si and Hf/SiO2/Si systems | NobleID

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Ternary phase analysis of interfacial silicates grown in HfOx/Si and Hf/SiO2/Si systems

Identifier:nobleid.org/w1/20260515/ADE03465

Type:Journal Article

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