Junction Integrity for 28nm High-k nMOSFETs with Thermal Stress | NobleID

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Junction Integrity for 28nm High-k nMOSFETs with Thermal Stress

NobleID: NI0P02W22R83S78
Persistent link: https://nobleid.org/ark:/48914/w1/20260515/B7ECFE8C

Type:Journal Article

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Cheng-Hsun-Tony Chang

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