Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning

Chun‐Hung Liu; Chia-Hua Chang; Wen Lo; Shih-Ming Chang; Hsin-Wei Wu; Chien-Cheng Chen; Alex Chen; Shuo-Yen Chou; Ru-Gun Liu

doi:10.1117/12.2302685

Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning

Identifier:nobleid.org/w1/20260515/D64355AF

Type:Journal Article

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Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning

Identifier:nobleid.org/w1/20260515/D64355AF

Type:Journal Article

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