Effect of Rapid Thermal Annealing on Si-Based Dielectric Films Grown by ICP-CVD.

Irina Parkhomenko; Liudmila Vlasukova; Fadei Komarov; Nataliya Kovalchuk; Sergey Demidovich; Ainur Zhussupbekova; Kuanysh Zhussupbekov; Igor V Shvets; Oleg Milchanin; Dmitry Zhigulin

doi:10.1021/acsomega.3c04997

Effect of Rapid Thermal Annealing on Si-Based Dielectric Films Grown by ICP-CVD.

Identifier:nobleid.org/w1/20260515/DA030BEF

Type:Journal Article

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Effect of Rapid Thermal Annealing on Si-Based Dielectric Films Grown by ICP-CVD.

Identifier:nobleid.org/w1/20260515/DA030BEF

Type:Journal Article

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