Main

Mint Work Search Explore Works Knowledge Graph Citation Graph Bibliometrics Receipts

v1

EUVL mask substrate defect print study

Identifier:nobleid.org/w1/20260515/EEE511E6

Type:Conference Paper

0 views

Support unavailableClaim Your Authorship

View Original Paper Source

Embeddable Badge

[![NobleID](https://www.nobleid.org/api/badge/EEE511E6.svg?ark=w1%2F20260515%2FEEE511E6)](https://nobleid.org/work/w1/20260515/EEE511E6)

ARK Inflections

Metadata Policy

Metadata Formats

Bibliometric Analysis

Impact metrics, research fronts, co-authorship networks →

Authors & Claims

Paper Authors

Yoshihiro Tezuka

Takeo Hashimoto

Claim authorship of this work

info@nobleid.org

About FAQ Terms Policy Persistence & Resolver Service Policy Pricing

EUVL mask substrate defect print study | NobleID