Improvement of the interface of pulsed-laser-deposited Y2O3/Si | NobleID

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Improvement of the interface of pulsed-laser-deposited Y2O3/Si

Identifier:nobleid.org/w1/20260515/EF1DDB05

Type:Preprint

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Masanori Nishijima

Kouhei Haratake

Takeshi Yoshimura

Norifumi Fujimura

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