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Improving global CD uniformity by optimizing post-exposure bake and develop sequences | NobleID

v1

Improving global CD uniformity by optimizing post-exposure bake and develop sequences

Stephen P. Osborne, Mark Mueller, Homer Y. Lem, David Reyland, Ki‐Ho Baik

SO

Stephen P. Osborne

NobleIDNI4P61W50R69S84

Type:Conference Paper

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