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Quality Improvement of Ultrathin Gate Oxide by Using Thermal Growth Followed by SF ANO Technique | NobleID
v1
Quality Improvement of Ultrathin Gate Oxide by Using Thermal Growth Followed by SF ANO Technique
Yi-Lin Yang
,
Jenn‐Gwo Hwu
YY
Yi-Lin Yang
NobleID
NI3P31W97R65S53
Type:
Journal Article
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