Main

Mint Work Search Explore Works Knowledge Graph Citation Graph Bibliometrics Receipts

info@nobleid.org

About FAQ Developers Terms Policy Persistence & Resolver Service Policy

Mechanism of Plasma-Enhanced Deposition of Silicon Dioxide from Teos/O2 Mixtures | NobleID

v1

Mechanism of Plasma-Enhanced Deposition of Silicon Dioxide from Teos/O₂ Mixtures

Gregory B. Raupp, Timothy S. Cale, Peter Hammer, W. Hey

GR

Gregory B. Raupp

NobleIDNI5P84W26R89S13

Type:Conference Paper

Claim Your Authorship

Sign in to see the full record

Creating an account is free.

Create an account

For data access, contact info@nobleid.org.