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IC design in 65 nm and beyond: evolution or revolution? [Sunday Panel] | NobleID

v1

IC design in 65 nm and beyond: evolution or revolution? [Sunday Panel]

Jeffrey P. Cohn, U. Fassnacht, Jamil Kawa, SaniR . Nassif and 3 more

JC

Jeffrey P. Cohn

NobleIDNI9P33W72R39S38

Type:Journal Article

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