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About the oxidation of SiCl4 and GeCl4 in homogeneous gaseous phase | NobleID

v1

About the oxidation of SiCl₄ and GeCl₄ in homogeneous gaseous phase

P. Kleinert, D. Schmidt, J. Kirchhof, A. Funke

PK

P. Kleinert

NobleIDNI9P68W91R39S66

Type:Journal Article

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