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Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures
Work NobleIDNI1P81W85R14S20
Type:Journal Article
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Paper Authors
Ee Jin Teo
Maan M. Alkaisi
Andrew A. Bettiol
T. Osipowicz
J.A. van Kan
F. Watt
A. Markwitz