Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks | NobleID

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Effective passivation of Si surfaces by plasma deposited SiOx/a-SiNx:H stacks

Identifier:nobleid.org/w1/20260525/CBF93AB7

Type:Journal Article

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M. C. M. van de Sanden

W. M. M. Kessels

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