Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique

Vassallo, E.; Pedroni, Matteo; Saleh, Miriam; Minelli, D.; Firpo, Giuseppe; Miorin, Enrico; Deambrosis, Silvia Maria; Zin, Valentina; Ripamonti, D.; Origo, Luca

doi:10.3390/coatings15030319

Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique

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Type:Journal Article

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Silvia Maria Deambrosis

Valentina Zin

D. Ripamonti

Luca Origo

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Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique

NobleIDNI8P80W68R55S82

Type:Journal Article

0 views

Support unavailableClaim Your Authorship

Embeddable Badge

[![NobleID](https://www.nobleid.org/api/badge/AFF5ABC8.svg?ark=w1%2F20260526%2FAFF5ABC8&value=id)](https://nobleid.org/work/w1/20260526/AFF5ABC8)

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Paper Authors

Silvia Maria Deambrosis

Valentina Zin

D. Ripamonti

Luca Origo

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